Equipment

FabLab has the equipment and expertise needed to handle your projects' needs. A selection of our tools include:

• a Direct Write Electron Beam Lithography tool for creating features with dimensions as small as 20 nanometers or less
• an Atomic Layer Deposition system for depositing thins films one atomic layer at a time
• a Nanowire and Nanotube Growth system for silicon and germanium components
• an Inductively Coupled Plasma Etcher for III-V materials such as GaAs and InP
• a Plasma Enhanced Chemical Vapor Deposition system for stress free thin films
• an Environmental Scanning Electron microscope with surface analysis capability for in-situ evaluation of chemical and biological samples