Note: new bulb installed 12/13/13.
Intensity is substantially higher at ~14 mW/cm2 so check your times.
The Oriel Mask Aligner is a low-resolution mask alignment system. It can handle masks and substrates as large as 6” X 6”. The system is used primarily for copying masks or for single exposures where little or no alignment is required.
|Location||FabLab | Photo Tunnel|
|Discussion Link||Lithography Discussion Page
External Non-profit / University
Small Commercial / MTECH
|Reservations||No upcoming reservations at this time.
Please login to make a reservation.
You must have lab permissions to view the manuals.
Please login to view manuals or contact the lab staff to obtain permissions.
Photoresist ProcessesAZ4620_process.doc (25.5 KB)
NPR9 process.doc (24.5 KB)
NR9-1500PY.pdf (88.62 KB)
SPR220_resist_process.doc (25.5 KB)
baseline_shipley_1813_resist_chlorobenzene_lift.doc (28 KB)
chlorobenzene_lift.doc (28.5 KB)
photo_resist_pouring_procedure.doc (24 KB)
shipley_1813_positive_photolithography_process.doc (27 KB)