| Operational Status | ● Offline | |||||||||||||||
|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|
| Description |
Note: new bulb installed 12/13/13.
Intensity is substantially higher at ~14 mW/cm2 so check your times.
The Oriel Mask Aligner is a low-resolution mask alignment system. It can handle masks and substrates as large as 6” X 6”. The system is used primarily for copying masks or for single exposures where little or no alignment is required. |
|||||||||||||||
| Location | FabLab |
Photo Tunnel
|
|||||||||||||||
| Manufacturer |
Oriel |
|||||||||||||||
| Staff Contact |
FabLab Staff fablab@umd.edu |
|||||||||||||||
| Rates | UMD $75/hr External Non-profit / University $116/hr Small Commercial / MTECH $158/hr Large Commercial $220/hr No Charge $0/hr |
|||||||||||||||
| Reservations | No upcoming reservations at this time. | |||||||||||||||
| Logs |
|
|||||||||||||||
| SOPs |
|
|||||||||||||||
| Manuals | You must have lab permissions to view the manuals. Please login to view manuals or contact the lab staff to obtain permissions. |
|||||||||||||||
| Recipes | Photoresist ProcessesAZ4620_process.doc (25.5 KB)NPR9 process.doc (24.5 KB) NR9-1500PY.pdf (88.62 KB) SPR220_resist_process.doc (25.5 KB) baseline_shipley_1813_resist_chlorobenzene_lift.doc (28 KB) chlorobenzene_lift.doc (28.5 KB) photo_resist_pouring_procedure.doc (24 KB) shipley_1813_positive_photolithography_process.doc (27 KB) |
