July 22, 2024 UMD Home NanoCenter AIMLab
Back to Equipment List EVG 620 Mask Aligner
Description EVG- 620 is back in operation with a NEW power supply, new "Y" motion motor and PM. Note: bulb changed 11-11-2020 Intensity is now 24 mw/cm2

Do NOT turn off after use, use SO use the new track ball and left button

The EVG 620 is a two-sided contact alignment and exposure tool. It is configured for 3", 4" and 6" wafers only. Its minimum achievable feature size is approximately one micron.

Location FabLab | Photo Tunnel
Manufacturer EVG 620
Staff Contact JohnJohn Abrahams
External Non-profit / University
Small Commercial / MTECH
Large Commercial
No Charge
Reservations No upcoming reservations at this time.
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External Materials

If you plan to bring external materials into the lab, please notify the FabLab staff to ensure proper safety protocols and any equipment arrangements can be made ahead of your reservation. Please submit an External Materials Request form for each material you will bring.

Tue, Jul 19, 2022
1:00 pm - 2:00 pm
Fow-Sen Choa
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Mon, Jun 13, 2022
9:30 am - 11:30 am
Jacqueline Hines
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Deleted by: Jacqueline Hines

M1005 Expose
Tue, Jun 07, 2022
1:30 pm - 2:00 pm
Bo Miao
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Deleted by: Bo Miao

Fri, May 13, 2022
12:30 pm - 12:45 pm
Deric Session
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Fri, May 13, 2022
11:15 am - 11:30 am
Deric Session
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Deleted by: Deric Session

Records to show:
620Bondalign.pdf (1.01 MB)
620Lithography.pdf (995.56 KB)
index.php (38 B)
photo-05_sop_EVG620_mask_aligner.pdf (86.36 KB)

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