| Description |
EVG- 620 is back in operation with a NEW power supply, new "Y" motion motor and PM.
Note: bulb changed 11-11-2020
Intensity is now 24 mw/cm2
Do NOT turn off after use, use SO use the new track ball and left button The EVG 620 is a two-sided contact alignment and exposure tool. It is configured for 3", 4" and 6" wafers only. Its minimum achievable feature size is approximately one micron. |
|||||||||||||||
|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|
| Location | FabLab |
Photo Tunnel
|
|||||||||||||||
| Manufacturer |
EVG 620 |
|||||||||||||||
| Staff Contact |
 John Abrahamsjabrah@umd.edu 301-405-5018 |
|||||||||||||||
| Rates | UMD $81/hr External Non-profit / University $126/hr Small Commercial / MTECH $166/hr Large Commercial $242/hr No Charge $0/hr |
|||||||||||||||
| Reservations | No upcoming reservations at this time. Please login to make a reservation. |
|||||||||||||||
| External Materials |
If you plan to bring external materials into the lab, please notify the FabLab staff to ensure proper safety protocols and any equipment arrangements can be made ahead of your reservation. Please submit an External Materials Request form for each material you will bring. |
|||||||||||||||
| Logs |
|
|||||||||||||||
| SOPs |
|
|||||||||||||||
| Manuals
You must have reservation permissions to view the manuals. Please login to view manuals. |
||||||||||||||||
| Recipes | Photoresist ProcessesAZ4620_process.doc (25.5 KB)NPR9 process.doc (24.5 KB) NR9-1500PY.pdf (88.62 KB) SPR220_resist_process.doc (25.5 KB) baseline_shipley_1813_resist_chlorobenzene_lift.doc (28 KB) chlorobenzene_lift.doc (28.5 KB) photo_resist_pouring_procedure.doc (24 KB) shipley_1813_positive_photolithography_process.doc (27 KB) |
