July 22, 2024 UMD Home NanoCenter AIMLab
Description The Strasbaugh 6EC Chemical Mechanical Polisher (CMP) is used to remove thin layers of SiO2 on silicon wafers for planarization of devices and circuits. It is located in the subfab and is only available to users approved by and trained by FabLab staff.
Location FabLab | Subfab
Manufacturer Strasbaugh 6EC
Staff Contact JohnJohn Abrahams
Reservations No upcoming reservations at this time.
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External Materials

If you plan to bring external materials into the lab, please notify the FabLab staff to ensure proper safety protocols and any equipment arrangements can be made ahead of your reservation. Please submit an External Materials Request form for each material you will bring.

Tue, Mar 24, 2009
8:45 am - 9:00 am
Thao Nguyen
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training with Jon H.
Thu, Feb 19, 2009
7:30 pm - 8:30 pm
Aaron Gerratt
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Thu, Feb 19, 2009
1:30 pm - 4:00 pm
Aaron Gerratt
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Mon, Feb 09, 2009
2:00 pm - 7:00 pm
Aaron Gerratt
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Wed, Jan 28, 2009
1:45 pm - 6:30 pm
Aaron Gerratt
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cmp pdms/si
Records to show:
bkside-01_sop.pdf (766.08 KB)
index.php (38 B)

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