| Description |
The Raith e_line is a versatile e-beam system for nano structuring, patterning and imaging using a Thermal Field Emission filament for ultra high resolution capability. Patterns can be done in either stitching mode or "Fixed Beam Moving Stage" mode. FBMS eliminates stitching errors on larger structures such as wave guides that can range over multiple millimeter distances. The electron column has a unique cross over free beam path that give high beam current and exceedingly low aberrations for top quality patterning and unsurpassed low voltage imaging even below 1keV.
3/27/2025 MIBK is available for developing again.
For runs longer than 4-5 hours please start your run in the evening and let it run over night. |
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| Location | FabLab | Exploratory Lab SEM room | |||||||||||||||
| Manufacturer |
Raith |
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| Staff Contact |
 Jonathan Hummeljhummel1@umd.edu 301 405-5017 |
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| Rates | Large Commercial $182/hr Small Commercial / MTECH $103/hr External Non-profit / University $73/hr UMD $47/hr No Charge $0/hr |
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| Reservations |
Please login to make a reservation. |
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| External Materials |
If you plan to bring external materials into the lab, please notify the FabLab staff to ensure proper safety protocols and any equipment arrangements can be made ahead of your reservation. Please submit an External Materials Request form for each material you will bring. |
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| Logs |
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| SOPs |
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| Manuals
You must have reservation permissions to view the manuals. Please login to view manuals. |
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| Recipes | Photoresist ProcessesAZ4620_process.doc (25.5 KB)NPR9 process.doc (24.5 KB) NR9-1500PY.pdf (88.62 KB) SPR220_resist_process.doc (25.5 KB) baseline_shipley_1813_resist_chlorobenzene_lift.doc (28 KB) chlorobenzene_lift.doc (28.5 KB) photo_resist_pouring_procedure.doc (24 KB) shipley_1813_positive_photolithography_process.doc (27 KB) |
