November 16, 2025 UMD Home NanoCenter AIM Lab
Back to Equipment List Oxford ICP Etcher(Chlorine)
Description This Oxford Plasmalab System 100 is an Inductively Coupled Plasma (ICP) reactive ion etcher. Gases plumbed to the system include:
  • Cl2, O2
  • SiCl4, SF6
  • CH4, Ar
  • H2, N2
This etcher is used primarily for etching III-V materials and aluminum.

The standard operating procedure for this tool is loaded into the PC that supports the ICP etcher.
Location FabLab | ETCH Tunnel
Manufacturer Oxford Instruments
Staff Contact MarkMark Lecates
mlecates@umd.edu
301-405-5197
Rates
Large Commercial
$242/hr
Small Commercial / MTECH
$166/hr
External Non-profit / University
$126/hr
UMD
$81/hr
No Charge
$0/hr
Reservations
Date Start End User
11/18/2025 12:00 PM 01:00 PM Mark Lecates

Please login to make a reservation.
External Materials

If you plan to bring external materials into the lab, please notify the FabLab staff to ensure proper safety protocols and any equipment arrangements can be made ahead of your reservation. Please submit an External Materials Request form for each material you will bring.

Logs
Tue, Nov 18, 2025
12:00 pm - 1:00 pm
Mark Lecates
View Reservation
Atif
Fri, Nov 14, 2025
2:00 pm - 2:45 pm
Eli Bader
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Fri, Nov 14, 2025
1:30 pm - 1:45 pm
Iris Boateng
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Thu, Nov 13, 2025
2:30 pm - 2:45 pm
Eli Bader
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Thu, Nov 13, 2025
1:15 pm - 2:30 pm
Iris Boateng
View Reservation
Records to show:
SOPs
Oxford Chlorine Etcher SOP.pdf (384 KB)
index.php (38 B)
Manuals

You must have reservation permissions to view the manuals. Please login to view manuals.

Recipes

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