| Description |
This Oxford Plasmalab System 100 is a Plasma Enhanced Chemical Vapor Deposition (PECVD) system. It is used to deposit low-stress thin films with excellent step coverage on a variety of samples at low temperatures (generally 200 - 300 O C). These thin films include:
|
|||||||||||||||
|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|
| Location | FabLab |
CVD Tunnel
|
|||||||||||||||
| Manufacturer |
Oxford Instruments PlasmaLab System 100 Link |
|||||||||||||||
| Staff Contact |
 Thomas Loughrantcl@umd.edu 301-405-3642 |
|||||||||||||||
| Rates | UMD $81/hr External Non-profit / University $126/hr Small Commercial / MTECH $166/hr Large Commercial $242/hr No Charge $0/hr |
|||||||||||||||
| Reservations |
Please login to make a reservation. |
|||||||||||||||
| External Materials |
If you plan to bring external materials into the lab, please notify the FabLab staff to ensure proper safety protocols and any equipment arrangements can be made ahead of your reservation. Please submit an External Materials Request form for each material you will bring. |
|||||||||||||||
| Logs |
|
|||||||||||||||
| SOPs |
|
|||||||||||||||
| Manuals
You must have reservation permissions to view the manuals. Please login to view manuals. |
||||||||||||||||
| Recipes | PECVD RecipesHigh Quality SiON PECVD.tif (96.05 KB)High Qulaity SiO2 PECVD.tif (78.22 KB) SiNx PECVD.tif (102.04 KB) TEOS based SiO2 PECVD.tif (100.2 KB) a-Si PECVD.tif (74.76 KB) a-Si_PECVD.txt (845 B) |
