April 16, 2025 UMD Home NanoCenter AIMLab
Back to Equipment List Critical Point Dryer
Description

The Supercritical Point Dryer anti-stiction release system increases both yield and uniformity of MEMS devices. Carbon dioxide is used as the transitional dry release fluid following wet etching steps. Auto-Process up to 5 - 4" wafers in less than 1 hour.

Location FabLab | ETCH Tunnel
Manufacturer
Staff Contact JonathanJonathan Hummel
jhummel1@umd.edu
301 405-5017
Rates
Large Commercial
$242/hr
Small Commercial / MTECH
$166/hr
External Non-profit / University
$126/hr
UMD
$81/hr
No Charge
$0/hr
Reservations No upcoming reservations at this time.
Please login to make a reservation.
External Materials

If you plan to bring external materials into the lab, please notify the FabLab staff to ensure proper safety protocols and any equipment arrangements can be made ahead of your reservation. Please submit an External Materials Request form for each material you will bring.

Logs
Thu, Dec 05, 2024
10:30 am - 11:30 am
Adira Colton
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Wed, May 29, 2024
2:30 pm - 4:00 pm
Vivek Vardhan Manepalli
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Fri, Apr 05, 2024
11:30 am - 12:30 pm
Vivek Vardhan Manepalli
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Wed, Nov 08, 2023
3:00 pm - 4:00 pm
Mohammad Habibur Rahaman
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Wed, Aug 09, 2023
12:30 pm - 1:30 pm
Mohammad Habibur Rahaman
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Records to show:
SOPs
Etch -13 Supercritical Point Dryer SOP.pdf (1.88 MB)
index.php (38 B)
Manuals

You must have reservation permissions to view the manuals. Please login to view manuals.

Recipes

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