March 29, 2024 UMD Home NanoCenter AIMLab
Back to Equipment List Critical Point Dryer
Description

The Supercritical Point Dryer anti-stiction release system increases both yield and uniformity of MEMS devices. Carbon dioxide is used as the transitional dry release fluid following wet etching steps. Auto-Process up to 5 - 4" wafers in less than 1 hour.

Location FabLab | ETCH Tunnel
Manufacturer
Staff Contact JonathanJonathan Hummel
jhummel1@umd.edu
301 405-5017
Rates
UMD
$81/hr
External Non-profit / University
$126/hr
Small Commercial / MTECH
$166/hr
Large Commercial
$242/hr
No Charge
$0/hr
Reservations No upcoming reservations at this time.
Please login to make a reservation.
External Materials

If you plan to bring external materials into the lab, please notify the FabLab staff to ensure proper safety protocols and any equipment arrangements can be made ahead of your reservation. Please submit an External Materials Request form for each material you will bring.

Logs
Wed, Nov 08, 2023
3:00 pm - 4:00 pm
Mohammad Habibur Rahaman
View Reservation
Wed, Aug 09, 2023
12:30 pm - 1:30 pm
Mohammad Habibur Rahaman
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Thu, Jul 27, 2023
11:30 am - 12:30 pm
Mohammad Habibur Rahaman
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Wed, Jul 05, 2023
5:00 pm - 6:00 pm
Mohammad Habibur Rahaman
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Wed, Jul 05, 2023
4:30 pm - 5:00 pm
Mohammad Habibur Rahaman
View Reservation
Records to show:
SOPs
Etch -13 Supercritical Point Dryer SOP.pdf (1.88 MB)
index.php (38 B)
Manuals

You must have reservation permissions to view the manuals. Please login to view manuals.

Recipes

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