| Description |
This Oxford Plasmalab System 100 is an Inductively Coupled Plasma (ICP) reactive ion etcher.
Gases plumbed to the system include:
SF6-C4F8-CHF3-CF4-Ar-O2-He
This etcher is used primarily for etching silicon and silicon oxides. The standard operating procedure and recipes for this tool is loaded into the PC that supports the ICP etcher. |
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| Location | FabLab |
ETCH Tunnel
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| Manufacturer |
Oxford Instruments |
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| Staff Contact |
 Mark Lecatesmlecates@umd.edu 301-405-5197 |
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| Rates | UMD $81/hr External Non-profit / University $126/hr Small Commercial / MTECH $166/hr Large Commercial $242/hr No Charge $0/hr |
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| Reservations |
Please login to make a reservation. |
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| External Materials |
If you plan to bring external materials into the lab, please notify the FabLab staff to ensure proper safety protocols and any equipment arrangements can be made ahead of your reservation. Please submit an External Materials Request form for each material you will bring. |
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| Logs |
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| SOPs |
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| Manuals
You must have reservation permissions to view the manuals. Please login to view manuals. |
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| Recipes |
