June 17, 2024 UMD Home NanoCenter AIMLab
Back to Equipment List MA-4 Suss Mask Aligner
Description The Karl Suss MA-4 Mask Aligner is used with substrates up to 4" (100mm) in diameter. It also works for smaller samples. It is a contact/proximity aligner and can be set to utilize either 365 nm or 405 nm light. It is used with a variety of both positive and negative photoresists. Recipes for our standard photoresist processing are attached to the back of the operating instructions below. This system also offers real-time infrared through-wafer backside alignment.
Location FabLab | Photo Tunnel
Manufacturer Karl Suss MA-4
Staff Contact MarkMark Lecates
External Non-profit / University
Small Commercial / MTECH
Large Commercial
No Charge
Reservations No upcoming reservations at this time.
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External Materials

If you plan to bring external materials into the lab, please notify the FabLab staff to ensure proper safety protocols and any equipment arrangements can be made ahead of your reservation. Please submit an External Materials Request form for each material you will bring.

Tue, May 21, 2024
11:30 am - 12:00 pm
Mitchell Gross
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Wed, May 08, 2024
2:30 pm - 3:00 pm
Ryan Purcell
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Fri, Apr 05, 2024
10:45 am - 11:15 am
Ryan Purcell
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Tue, Mar 26, 2024
12:00 pm - 12:30 pm
Mitchell Gross
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Tue, Feb 20, 2024
11:30 am - 12:00 pm
Deric Session
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Records to show:
MA- 4 Operating Instructions.pdf (21.04 MB)
index.php (38 B)

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