|The Maskless Aligner MLA 150 is a state-of-the-art maskless lithography tool. Areas of application include nanofabrication of quantum devices (2D materials, semiconductor materials, nanowires, etc.) MEMS, micro-optical elements, sensors, actuators, MOEMS and other devices for materials and life sciences. Depending on the application, the MLA 150 patterns high-resolution, high aspect ratio, and even simple grayscale structures. It is available with 375nm and 405nm lasers, have pneumatic autofocus, and is able to pattern from 12mm to 6in wafer. Check with resist manufacturer to find the dosage window.
|FabLab | Photolithography Tunnel
Heidelberg MLA 150
External Non-profit / University
Small Commercial / MTECH
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