March 10, 2026 UMD Home NanoCenter AIM Lab
Back to Equipment List Heidelberg MLA150 Maskless Aligner
Description The Maskless Aligner MLA 150 is a state-of-the-art maskless lithography tool. Areas of application include nanofabrication of quantum devices (2D materials, semiconductor materials, nanowires, etc.) MEMS, micro-optical elements, sensors, actuators, MOEMS and other devices for materials and life sciences. Depending on the application, the MLA 150 patterns high-resolution, high aspect ratio, and even simple grayscale structures. It is available with 375nm and 405nm lasers, have pneumatic autofocus, and is able to pattern from 12mm to 6in wafer. Check with resist manufacturer to find the starting dosage. New resists will require optimization. NOTE: 1) Users are limited to 3 hours max during normal hours (7 AM to 5 PM). Either 1 long reservation, or several smaller ones totaling 3 hours 2) If longer runs or additional times are needed, reservations must be made during after-hours (after 5 PM) 3) Do not use the tool without reserving it 4) Do not make any reservations further than a week in advance 5) Do not make reservations for more than 2 days at a time 6) Be ready to use the tool during the time(s) you have it reserved. Arrive early to clean your sample, spin & bake resist, etc. so that you can begin your write when your reservation starts 7) Failure to follow these guidelines will result in loss of tool access
Location FabLab | Photolithography Tunnel
Manufacturer Heidelberg MLA 150
Staff Contact NamNam Kim
nsk0248@umd.edu
301-405-6664
Rates
No Charge
$0/hr
Large Commercial
$242/hr
Small Commercial / MTECH
$166/hr
External Non-profit / University
$126/hr
UMD
$81/hr
Reservations
Date Start End User
03/10/2026 10:00 AM 11:30 AM Lyanne Rivera Vazquez
03/10/2026 12:00 PM 01:00 PM Yuma Sasaki

Please login to make a reservation.
External Materials

If you plan to bring external materials into the lab, please notify the FabLab staff to ensure proper safety protocols and any equipment arrangements can be made ahead of your reservation. Please submit an External Materials Request form for each material you will bring.

Logs
Tue, Mar 10, 2026
12:00 pm - 1:00 pm
Yuma Sasaki
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Tue, Mar 10, 2026
10:00 am - 11:30 am
Lyanne Rivera Vazquez
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Mon, Mar 09, 2026
4:00 pm - 5:00 pm
Max Neiderbach
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Deleted by: Max Neiderbach

Photolithography for 4 chips
Mon, Mar 09, 2026
10:00 am - 11:00 am
Ryan Purcell
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Fri, Mar 06, 2026
6:30 pm - 7:00 pm
Weijian Xian
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Records to show:
SOPs
SOP for MLA150 V2.docx (10.51 MB)
Manuals

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Recipes

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