March 4, 2024 UMD Home NanoCenter AIMLab
Back to Equipment List Heidelberg MLA150 Maskless Aligner
Description The Maskless Aligner MLA 150 is a state-of-the-art maskless lithography tool. Areas of application include nanofabrication of quantum devices (2D materials, semiconductor materials, nanowires, etc.) MEMS, micro-optical elements, sensors, actuators, MOEMS and other devices for materials and life sciences. Depending on the application, the MLA 150 patterns high-resolution, high aspect ratio, and even simple grayscale structures. It is available with 375nm and 405nm lasers, have pneumatic autofocus, and is able to pattern from 12mm to 6in wafer. Check with resist manufacturer to find the dosage window.
Location FabLab | Photolithography Tunnel
Manufacturer Heidelberg MLA 150
Staff Contact NamNam Kim
External Non-profit / University
Small Commercial / MTECH
Large Commercial
No Charge
Date Start End User
03/05/2024 09:00 AM 10:00 AM Siddharth Raghu Srimathi
03/05/2024 10:00 AM 11:00 AM Brendan Jordan
03/05/2024 11:00 AM 12:00 PM Niko Reed
03/05/2024 12:30 PM 02:00 PM Siddharth Raghu Srimathi
03/05/2024 02:30 PM 03:30 PM Spencer Caverly

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External Materials

If you plan to bring external materials into the lab, please notify the FabLab staff to ensure proper safety protocols and any equipment arrangements can be made ahead of your reservation. Please submit an External Materials Request form for each material you will bring.

Fri, Mar 08, 2024
10:00 am - 10:30 am
Wonchan Lee
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Thu, Mar 07, 2024
4:00 pm - 6:00 pm
Rachid Jamil
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Thu, Mar 07, 2024
10:00 am - 12:00 pm
Andrew Evangelista
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Wed, Mar 06, 2024
3:30 pm - 5:30 pm
Rachid Jamil
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With Nam
Wed, Mar 06, 2024
9:45 am - 10:15 am
Wonchan Lee
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Records to show:
SOP for MLA150 V2.docx (10.51 MB)

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