| Description |
The PlasmaPro 100 PECVD system is specifically designed to produce high quality films with excellent uniformity and control of film properties such as refractive index, stress, electrical characteristics and wet chemical etch rate. Our cutting-edge Plasma Enhanced CVD system is suitable for dielectric films passivation (e.g. SiO2, SixNy), silicon carbide, amorphous silicon, hard mask deposition and anti-reflective coatings.
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| Location | FabLab |
CVD Tunnel
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| Manufacturer |
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| Staff Contact |
 Mark Lecatesmlecates@umd.edu 301-405-5197 |
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| Rates | No Charge $0/hr Large Commercial $266/hr Small Commercial / MTECH $183/hr External Non-profit / University $139/hr UMD $89/hr |
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| Reservations | No upcoming reservations at this time. Please login to make a reservation. |
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| External Materials |
If you plan to bring external materials into the lab, please notify the FabLab staff to ensure proper safety protocols and any equipment arrangements can be made ahead of your reservation. Please submit an External Materials Request form for each material you will bring. |
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| Logs |
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| Manuals
You must have reservation permissions to view the manuals. Please login to view manuals. |
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| Recipes |
