| Description |
This Oxford PlasmaPro 100 Cobra 300 is an Inductively Coupled Plasma (ICP) reactive ion etcher. Gases plumbed to the system include: Ar-O2-Sf6-BCL3-SiCl4-H2-CH4. This etcher is used primarily for etching GaAs and InP |
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| Location | FabLab |
ETCH Tunnel
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| Manufacturer |
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| Staff Contact |
 Nam Kimnsk0248@umd.edu 301-405-6664 |
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| Rates | Large Commercial $266/hr Small Commercial / MTECH $183/hr UMD $89/hr External Non-profit / University $139/hr Staff Technical Assistance Time is added based on the time spent by staff members providing technical support, guidance & training outside of equipment training, and technical services for users of the lab. Click here for full rate details.
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| Reservations |
Please login to make a reservation. |
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| External Materials |
If you plan to bring external materials into the lab, please notify the FabLab staff to ensure proper safety protocols and any equipment arrangements can be made ahead of your reservation. Please submit an External Materials Request form for each material you will bring. |
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| Logs |
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| Manuals
You must have reservation permissions to view the manuals. Please login to view manuals. |
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| Recipes |
