| Description |
Note: bulb changed 7-05-2016!
Intensity is now 17 mw/cm2
Do NOT turn off after use, use SO use the new track ball and left button The EVG 620 is a two-sided contact alignment and exposure tool. It is configured for 3", 4" and 6" wafers only. Its minimum achievable feature size is approximately one micron. The EVG 620 is fitted with a special fixture which facilitates precise registration of two wafers in the aligner prior to using the EVG 01 Wafer Bonder. |
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| Location | FabLab |
Photo Tunnel
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| Manufacturer |
EVG 620 |
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| Staff Contact |
 John Abrahamsjabrah@umd.edu 301-405-6664 |
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| Discussion Link | Lithography Discussion Page Login Help |
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| Rates | UMD $71/hr External Non-profit / University $108/hr Small Commercial / MTECH $150/hr Large Commercial $200/hr |
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| Reservations | No upcoming reservations at this time. Please login to make a reservation. |
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| Logs |
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| SOPs |
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| Manuals | You must have lab permissions to view the manuals. Please login to view manuals or contact the lab staff to obtain permissions. |
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| Recipes | Photoresist ProcessesAZ4620_process.doc (25.5 KB)NPR9 process.doc (24.5 KB) NR9-1500PY.pdf (88.62 KB) SPR220_resist_process.doc (25.5 KB) baseline_shipley_1813_resist_chlorobenzene_lift.doc (28 KB) chlorobenzene_lift.doc (28.5 KB) photo_resist_pouring_procedure.doc (24 KB) shipley_1813_positive_photolithography_process.doc (27 KB) |
