March 24, 2023 UMD Home FabLab AIMLab
EVG 620 Mask Aligner Back to Equipment List
Operational Status ‚óŹ In maintenance
Description EVG- 620 is back in operation with a NEW power supply, new "Y" motion motor and PM. Note: bulb changed 11-11-2020 Intensity is now 24 mw/cm2

Do NOT turn off after use, use SO use the new track ball and left button

The EVG 620 is a two-sided contact alignment and exposure tool. It is configured for 3", 4" and 6" wafers only. Its minimum achievable feature size is approximately one micron.

Location FabLab | Photo Tunnel
Manufacturer EVG 620
Staff Contact JohnJohn Abrahams
External Non-profit / University
Small Commercial / MTECH
Large Commercial
No Charge
Reservations No upcoming reservations at this time.
Tue, Jul 19, 2022
1:00 pm - 2:00 pm
Fow-Sen Choa
View Reservation
Mon, Jun 13, 2022
9:30 am - 11:30 am
Jacqueline Hines
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Deleted by: Jacqueline Hines

M1005 Expose
Tue, Jun 07, 2022
1:30 pm - 2:00 pm
Bo Miao
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Deleted by: Bo Miao

Fri, May 13, 2022
12:30 pm - 12:45 pm
Deric Session
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Fri, May 13, 2022
11:15 am - 11:30 am
Deric Session
View Reservation

Deleted by: Deric Session

Records to show:
620Bondalign.pdf (1.01 MB)
620Lithography.pdf (995.56 KB)
index.php (38 B)
photo-05_sop_EVG620_mask_aligner.pdf (86.36 KB)

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Colleges A. James Clark School of Engineering
The College of Computer, Mathematical, and Natural Sciences

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