| Operational Status | ● Online | |||||||||||||||
|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|
| Description |
The Karl Suss MJB-3 Mask Aligner is used with substrates up to 3" in diameter. It also works for smaller samples.
It is a contact/proximity aligner and can be set to utilize either 365 nm or 405 nm light.
It is used with a variety of both positive and negative photoresists.
Recipes for our standard photoresist processing are attached to the back of the operating instructions below. |
|||||||||||||||
| Location | FabLab |
Teaching Lab
|
|||||||||||||||
| Manufacturer |
Karl Suss America Inc. MJB-3 |
|||||||||||||||
| Staff Contact |
FabLab Staff fablab@umd.edu |
|||||||||||||||
| Rates | Large Commercial $242/hr Small Commercial / MTECH $166/hr External Non-profit / University $126/hr UMD $81/hr No Charge $0/hr |
|||||||||||||||
| Reservations |
|
|||||||||||||||
| Logs |
|
|||||||||||||||
| SOPs |
|
|||||||||||||||
| Manuals | You must have lab permissions to view the manuals. Please login to view manuals or contact the lab staff to obtain permissions. |
|||||||||||||||
| Recipes | Photoresist ProcessesAZ4620_process.doc (25.5 KB)NPR9 process.doc (24.5 KB) NR9-1500PY.pdf (88.62 KB) SPR220_resist_process.doc (25.5 KB) baseline_shipley_1813_resist_chlorobenzene_lift.doc (28 KB) chlorobenzene_lift.doc (28.5 KB) photo_resist_pouring_procedure.doc (24 KB) shipley_1813_positive_photolithography_process.doc (27 KB) |
