The RAITH eLine Direct Write Ebeam System is FabLab’s primary choice for ultra high resolution patterning, while handling up to 4 inch wafers. For complex applications using masks and wafers, there are sophisticated options like height sensing and leveling, which keep the sample in focus even over these large travel ranges, and field stitching for large area patterns. The ultimate linewidth resolution of this tool is less than 20 nm.
The Raith Offline Computer is available for users to edit their write routines without tying up the Raith eLine system.
There is not charge for using this computer, however there is a charge for getting an account and basic training on this computer. This is same rate as using the e_line.
|Location||FabLab | Exploratory Lab|
|Discussion Link||Lithography Discussion Page
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