November 20, 2017 UMD Home FabLab AIMLab
Back to Equipment List Raith off line computer
Description

The RAITH eLine Direct Write Ebeam System is FabLab’s primary choice for ultra high resolution patterning, while handling up to 4 inch wafers. For complex applications using masks and wafers, there are sophisticated options like height sensing and leveling, which keep the sample in focus even over these large travel ranges, and field stitching for large area patterns. The ultimate linewidth resolution of this tool is less than 20 nm.

The Raith Offline Computer is available for users to edit their write routines without tying up the Raith eLine system.

There is not charge for using this computer, however there is a charge for getting an account and basic training on this computer. This is same rate as using the e_line.

Location FabLab | Exploratory Lab
Manufacturer Raith
Staff Contact JonathanJonathan Hummel
jhummel1@umd.edu
301 405-5017
Discussion Link Lithography Discussion Page
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Rates
UMD
$0/hr
External Non-profit / University
$0/hr
Small Commercial / MTECH
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Reservations No upcoming reservations at this time.
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Logs
Tue, Nov 07, 2017
1:30 pm - 2:00 pm
Sabyasachi Barik
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Tue, Oct 10, 2017
4:00 pm - 4:30 pm
Hyun-Tae Kim
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Fri, Aug 11, 2017
3:00 pm - 7:00 pm
James Carbin
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Deleted by: James Carbin

Fri, Aug 04, 2017
10:45 am - 11:15 am
James Carbin
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Thu, Aug 03, 2017
2:30 pm - 3:00 pm
Aziz Karasahin
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Manuals

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Recipes

Colleges A. James Clark School of Engineering
The College of Computer, Mathematical, and Natural Sciences

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