September 23, 2017 UMD Home FabLab AIMLab
Back to Equipment List Atomic Layer Deposition System
Description Check with John Abrahams for special instructions for use for the time being. The Beneq Atomic Layer Deposition system in FabLab is currently configured for Aluminum Oxide, Titanium Oxide, Titanium Nitride and Zinc Oxide deposition. Warning: This system uses flammable materials such as Tri-Methyl Aluminum. Operation is limited to users approved and trained by FabLab staff. We have all precursors back in operation as of 3-7-2017
Location FabLab | CVD Tunnel
Manufacturer Beneq TFS 500 ALD
Link
Staff Contact JohnJohn Abrahams
jabrah@umd.edu
301-405-6664
Discussion Link Deposition Discussion Page
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Rates
UMD
$71/hr
External Non-profit / University
$108/hr
Small Commercial / MTECH
$150/hr
Large Commercial
$230/hr
Reservations No upcoming reservations at this time.
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Logs
Thu, Sep 21, 2017
9:45 pm - 11:15 pm
Ivan Penskiy
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Thu, Sep 21, 2017
2:15 pm - 4:00 pm
David Somers
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Wed, Sep 20, 2017
10:15 pm - 11:15 pm
Ivan Penskiy
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Mon, Sep 18, 2017
6:00 pm - 6:30 pm
Yonggang Yao
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Mon, Sep 18, 2017
2:30 pm - 3:00 pm
David Somers
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Records to show:
SOPs
cvd-03_TFS_500_ALD_System_overview.pdf (1.02 MB)
cvd-03_tfs_500_tech_sheet.pdf (183.77 KB)
index.php (38 B)
Manuals

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Recipes

Colleges A. James Clark School of Engineering
The College of Computer, Mathematical, and Natural Sciences

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