September 23, 2017 UMD Home FabLab AIMLab
Back to Equipment List Atomic Layer Deposition System
Description Check with John Abrahams for special instructions for use for the time being. The Beneq Atomic Layer Deposition system in FabLab is currently configured for Aluminum Oxide, Titanium Oxide, Titanium Nitride and Zinc Oxide deposition. Warning: This system uses flammable materials such as Tri-Methyl Aluminum. Operation is limited to users approved and trained by FabLab staff. We have all precursors back in operation as of 3-7-2017
Location FabLab | CVD Tunnel
Manufacturer Beneq TFS 500 ALD
Staff Contact JohnJohn Abrahams
Discussion Link Deposition Discussion Page
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External Non-profit / University
Small Commercial / MTECH
Large Commercial
Reservations No upcoming reservations at this time.
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Thu, Sep 21, 2017
9:45 pm - 11:15 pm
Ivan Penskiy
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Thu, Sep 21, 2017
2:15 pm - 4:00 pm
David Somers
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Wed, Sep 20, 2017
10:15 pm - 11:15 pm
Ivan Penskiy
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Mon, Sep 18, 2017
6:00 pm - 6:30 pm
Yonggang Yao
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Mon, Sep 18, 2017
2:30 pm - 3:00 pm
David Somers
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Records to show:
cvd-03_TFS_500_ALD_System_overview.pdf (1.02 MB)
cvd-03_tfs_500_tech_sheet.pdf (183.77 KB)
index.php (38 B)

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