May 31, 2023 UMD Home FabLab AIMLab
Critical Point Dryer Back to Equipment List
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The Supercritical Point Dryer anti-stiction release system increases both yield and uniformity of MEMS devices. Carbon dioxide is used as the transitional dry release fluid following wet etching steps. Auto-Process up to 5 - 4" wafers in less than 1 hour.

Location FabLab | ETCH Tunnel
Staff Contact JonathanJonathan Hummel
301 405-5017
External Non-profit / University
Small Commercial / MTECH
Large Commercial
No Charge
Reservations No upcoming reservations at this time.
Tue, May 30, 2023
12:00 pm - 1:00 pm
Mohammad Habibur Rahaman
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Thu, May 25, 2023
11:00 am - 12:00 pm
Mohammad Habibur Rahaman
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Wed, May 24, 2023
11:00 am - 12:00 pm
Mohammad Habibur Rahaman
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Deleted by: Jonathan Hummel

Tue, May 23, 2023
10:00 am - 12:00 pm
Sangyoon Kim
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Fri, May 19, 2023
9:00 am - 10:00 am
Mohammad Habibur Rahaman
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Records to show:
Etch -13 Supercritical Point Dryer SOP.pdf (1.88 MB)
index.php (38 B)

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Colleges A. James Clark School of Engineering
The College of Computer, Mathematical, and Natural Sciences

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