September 26, 2017 UMD Home FabLab AIMLab
Back to Equipment List Branson Barrel Resist Stripper
Description

The Branson Barrel Photoresist Stripper is used to remove photoresist residue by means of an oxygen plasma. Much less aggressive than the FabLab March stripper, the Branson minimizes substrate damage.

To save wear and tear, excessive chamber cleaning and tool availability of our ICP etchers, please use the Branson rather than the Oxford tools for all photoresist descum etches.

Location FabLab | Photo Tunnel
Manufacturer Branson
Staff Contact MarkMark Lecates
mlecates@umd.edu
301-405-5197
Discussion Link Lithography Discussion Page
Login Help
Rates
UMD
$71/hr
External Non-profit / University
$108/hr
Small Commercial / MTECH
$150/hr
Large Commercial
$200/hr
Reservations No upcoming reservations at this time.
Please login to make a reservation.
Logs
Tue, Sep 26, 2017
5:30 pm - 5:45 pm
Andrew Lamont
View Reservation
Bonding PDMS to glass
Tue, Sep 26, 2017
12:45 pm - 1:15 pm
Lisa Tostanoski
View Reservation
Tue, Sep 26, 2017
10:30 am - 10:45 am
Abraham Chen
View Reservation
Mon, Sep 25, 2017
9:30 pm - 9:45 pm
Nam Kim
View Reservation
Mon, Sep 25, 2017
4:30 pm - 4:45 pm
Abraham Chen
View Reservation
Records to show:
SOPs
Photo-14 - SOP - Branson Photoresist Stripper.pdf (593.24 KB)
index.php (38 B)
Manuals

You must have lab permissions to view the manuals.

Please login to view manuals or contact the lab staff to obtain permissions.

Recipes

Colleges A. James Clark School of Engineering
The College of Computer, Mathematical, and Natural Sciences

Communicate Contact Us
Contact the Webmaster
Google+
Follow us on TwitterTwitter logo

Links Privacy Policy
Sitemap
RSS

Copyright The University of Maryland University of Maryland
2004-2017