February 25, 2018 UMD Home FabLab AIMLab
Back to Equipment List Branson Barrel Resist Stripper
Description

The Branson Barrel Photoresist Stripper is used to remove photoresist residue by means of an oxygen plasma. Much less aggressive than the FabLab March stripper, the Branson minimizes substrate damage.

To save wear and tear, excessive chamber cleaning and tool availability of our ICP etchers, please use the Branson rather than the Oxford tools for all photoresist descum etches.

Location FabLab | Photo Tunnel
Manufacturer Branson
Staff Contact MarkMark Lecates
mlecates@umd.edu
301-405-5197
Rates
UMD
$71/hr
External Non-profit / University
$108/hr
Small Commercial / MTECH
$150/hr
Large Commercial
$200/hr
Reservations No upcoming reservations at this time.
Please login to make a reservation.
Logs
Fri, Feb 23, 2018
2:45 pm - 3:15 pm
Nam Kim
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Thu, Feb 22, 2018
2:30 pm - 2:45 pm
Ryan Huiszoon
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PDMS Device Bonding
Thu, Feb 22, 2018
12:30 pm - 1:00 pm
Nam Kim
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Wed, Feb 21, 2018
1:30 pm - 2:00 pm
Mark Lecates
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Wed, Feb 21, 2018
10:30 am - 10:45 am
Michael Van Order
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100 W Ar exposure on FeGa for 10 min
Records to show:
SOPs
Photo-14 - SOP - Branson Photoresist Stripper.pdf (593.24 KB)
index.php (38 B)
Manuals

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Recipes

Colleges A. James Clark School of Engineering
The College of Computer, Mathematical, and Natural Sciences

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