February 25, 2018 UMD Home FabLab AIMLab
Back to Equipment List Branson Barrel Resist Stripper

The Branson Barrel Photoresist Stripper is used to remove photoresist residue by means of an oxygen plasma. Much less aggressive than the FabLab March stripper, the Branson minimizes substrate damage.

To save wear and tear, excessive chamber cleaning and tool availability of our ICP etchers, please use the Branson rather than the Oxford tools for all photoresist descum etches.

Location FabLab | Photo Tunnel
Manufacturer Branson
Staff Contact MarkMark Lecates
External Non-profit / University
Small Commercial / MTECH
Large Commercial
Reservations No upcoming reservations at this time.
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Fri, Feb 23, 2018
2:45 pm - 3:15 pm
Nam Kim
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Thu, Feb 22, 2018
2:30 pm - 2:45 pm
Ryan Huiszoon
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PDMS Device Bonding
Thu, Feb 22, 2018
12:30 pm - 1:00 pm
Nam Kim
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Wed, Feb 21, 2018
1:30 pm - 2:00 pm
Mark Lecates
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Wed, Feb 21, 2018
10:30 am - 10:45 am
Michael Van Order
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100 W Ar exposure on FeGa for 10 min
Records to show:
Photo-14 - SOP - Branson Photoresist Stripper.pdf (593.24 KB)
index.php (38 B)

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