November 22, 2017 UMD Home FabLab AIMLab
Back to Equipment List Branson Barrel Resist Stripper

The Branson Barrel Photoresist Stripper is used to remove photoresist residue by means of an oxygen plasma. Much less aggressive than the FabLab March stripper, the Branson minimizes substrate damage.

To save wear and tear, excessive chamber cleaning and tool availability of our ICP etchers, please use the Branson rather than the Oxford tools for all photoresist descum etches.

Location FabLab | Photo Tunnel
Manufacturer Branson
Staff Contact MarkMark Lecates
Discussion Link Lithography Discussion Page
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External Non-profit / University
Small Commercial / MTECH
Large Commercial
Reservations No upcoming reservations at this time.
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Tue, Nov 21, 2017
1:45 pm - 2:00 pm
Aysanew Abate
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Tue, Nov 21, 2017
10:30 am - 10:45 am
Andrew Lamont
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Bonding PDMS - glass
Tue, Nov 21, 2017
8:00 am - 8:15 am
David Shahin
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Mon, Nov 20, 2017
12:45 pm - 1:00 pm
Aysanew Abate
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Mon, Nov 20, 2017
10:00 am - 10:15 am
Andrew Liu
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15 min, bond chips
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Photo-14 - SOP - Branson Photoresist Stripper.pdf (593.24 KB)
index.php (38 B)

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