September 26, 2017 UMD Home FabLab AIMLab
Back to Equipment List Branson Barrel Resist Stripper

The Branson Barrel Photoresist Stripper is used to remove photoresist residue by means of an oxygen plasma. Much less aggressive than the FabLab March stripper, the Branson minimizes substrate damage.

To save wear and tear, excessive chamber cleaning and tool availability of our ICP etchers, please use the Branson rather than the Oxford tools for all photoresist descum etches.

Location FabLab | Photo Tunnel
Manufacturer Branson
Staff Contact MarkMark Lecates
Discussion Link Lithography Discussion Page
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Tue, Sep 26, 2017
5:30 pm - 5:45 pm
Andrew Lamont
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Tue, Sep 26, 2017
12:45 pm - 1:15 pm
Lisa Tostanoski
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Tue, Sep 26, 2017
10:30 am - 10:45 am
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Mon, Sep 25, 2017
9:30 pm - 9:45 pm
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Mon, Sep 25, 2017
4:30 pm - 4:45 pm
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Photo-14 - SOP - Branson Photoresist Stripper.pdf (593.24 KB)
index.php (38 B)

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