June 21, 2018 UMD Home FabLab AIMLab
Back to Equipment List Branson Barrel Resist Stripper

The Branson Barrel Photoresist Stripper is used to remove photoresist residue by means of an oxygen plasma. Much less aggressive than the FabLab March stripper, the Branson minimizes substrate damage.

To save wear and tear, excessive chamber cleaning and tool availability of our ICP etchers, please use the Branson rather than the Oxford tools for all photoresist descum etches.

Location FabLab | Photo Tunnel
Manufacturer Branson
Staff Contact MarkMark Lecates
External Non-profit / University
Small Commercial / MTECH
Large Commercial
Reservations No upcoming reservations at this time.
Thu, Jun 21, 2018
5:30 pm - 5:45 pm
Abraham Chen
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Thu, Jun 21, 2018
5:00 pm - 5:15 pm
Michael Van Order
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100W Ar exposure, 5 min ON, 5 min OFF, 5 min ON to minimize overheating. Samples: (110) and (111) single crystal FeGa mounted in Bakelite (thermoset).
Thu, Jun 21, 2018
2:00 pm - 2:15 pm
Mitchell Gross
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Thu, Jun 21, 2018
1:00 pm - 1:15 pm
Abdullah Alsharhan
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Thu, Jun 21, 2018
11:45 am - 12:15 pm
Benjamin Barnes
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Records to show:
Photo-14 - SOP - Branson Photoresist Stripper.pdf (593.24 KB)
index.php (38 B)

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