September 25, 2017 UMD Home FabLab AIMLab
Back to Equipment List MA-4 Suss Mask Aligner
Description The Karl Suss MA-4 Mask Aligner is used with substrates up to 4" (100mm) in diameter. It also works for smaller samples. It is a contact/proximity aligner and can be set to utilize either 365 nm or 405 nm light. It is used with a variety of both positive and negative photoresists. Recipes for our standard photoresist processing are attached to the back of the operating instructions below. This system also offers real-time infrared through-wafer backside alignment.
Location FabLab | Photo Tunnel
Manufacturer Karl Suss MA-4
Staff Contact JohnJohn Abrahams
jabrah@umd.edu
301-405-6664
Discussion Link Lithography Discussion Page
Login Help
Rates
UMD
$70/hr
External Non-profit / University
$108/hr
Small Commercial / MTECH
$150/hr
Large Commercial
$200/hr
Reservations No upcoming reservations at this time.
Please login to make a reservation.
Logs
Thu, Aug 31, 2017
1:00 pm - 2:00 pm
John Abrahams
View Reservation

Deleted by: John Abrahams

Tue, Aug 29, 2017
9:00 am - 9:30 am
John Abrahams
View Reservation
Training on MA-4
Records to show:
SOPs
MA- 4 Operating Instructions.pdf (21.04 MB)
index.php (38 B)
Manuals

You must have lab permissions to view the manuals.

Please login to view manuals or contact the lab staff to obtain permissions.

Recipes

Colleges A. James Clark School of Engineering
The College of Computer, Mathematical, and Natural Sciences

Communicate Contact Us
Contact the Webmaster
Google+
Follow us on TwitterTwitter logo

Links Privacy Policy
Sitemap
RSS

Copyright The University of Maryland University of Maryland
2004-2017