May 26, 2022 UMD Home FabLab AIMLab
MA-4 Suss Mask Aligner Back to Equipment List
Operational Status ‚óŹ Online
Description The Karl Suss MA-4 Mask Aligner is used with substrates up to 4" (100mm) in diameter. It also works for smaller samples. It is a contact/proximity aligner and can be set to utilize either 365 nm or 405 nm light. It is used with a variety of both positive and negative photoresists. Recipes for our standard photoresist processing are attached to the back of the operating instructions below. This system also offers real-time infrared through-wafer backside alignment.
Location FabLab | Photo Tunnel
Manufacturer Karl Suss MA-4
Staff Contact JohnJohn Abrahams
External Non-profit / University
Small Commercial / MTECH
Large Commercial
No Charge
Reservations No upcoming reservations at this time.
Wed, May 25, 2022
10:30 am - 11:00 am
Ryan Purcell
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Tue, May 24, 2022
10:15 am - 10:45 am
Sean O'Leary
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Mon, May 23, 2022
10:15 am - 10:45 am
Ryan Purcell
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Fri, May 20, 2022
1:45 am - 2:15 am
Ian Smith
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Thu, May 19, 2022
3:15 pm - 4:00 pm
Alisa White
View Reservation
Records to show:
MA- 4 Operating Instructions.pdf (21.04 MB)
index.php (38 B)

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Colleges A. James Clark School of Engineering
The College of Computer, Mathematical, and Natural Sciences

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