| Operational Status | ● Online | |||||||||||||||
|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|
| Description |
The Karl Suss MA-4 Mask Aligner is used with substrates up to 4" (100mm) in diameter. It also works for smaller samples. It is a contact/proximity aligner and can be set to utilize either 365 nm or 405 nm light. It is used with a variety of both positive and negative photoresists. Recipes for our standard photoresist processing are attached to the back of the operating instructions below. This system also offers real-time infrared through-wafer backside alignment. |
|||||||||||||||
| Location | FabLab |
Photo Tunnel
|
|||||||||||||||
| Manufacturer |
Karl Suss MA-4 |
|||||||||||||||
| Staff Contact |
 Mark Lecatesmlecates@umd.edu 301-405-5197 |
|||||||||||||||
| Rates | Large Commercial $242/hr Small Commercial / MTECH $166/hr External Non-profit / University $126/hr UMD $81/hr No Charge $0/hr |
|||||||||||||||
| Reservations | No upcoming reservations at this time. | |||||||||||||||
| Logs |
|
|||||||||||||||
| SOPs |
|
|||||||||||||||
| Manuals | You must have lab permissions to view the manuals. Please login to view manuals or contact the lab staff to obtain permissions. |
|||||||||||||||
| Recipes | Photoresist ProcessesAZ4620_process.doc (25.5 KB)NPR9 process.doc (24.5 KB) NR9-1500PY.pdf (88.62 KB) SPR220_resist_process.doc (25.5 KB) baseline_shipley_1813_resist_chlorobenzene_lift.doc (28 KB) chlorobenzene_lift.doc (28.5 KB) photo_resist_pouring_procedure.doc (24 KB) shipley_1813_positive_photolithography_process.doc (27 KB) |
