| Operational Status | ● Online | ||||||||||||||||
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| Description |
The Maskless Aligner MLA 150 is a state-of-the-art maskless lithography tool. Areas of application include nanofabrication of quantum devices (2D materials, semiconductor materials, nanowires, etc.) MEMS, micro-optical elements, sensors, actuators, MOEMS and other devices for materials and life sciences. Depending on the application, the MLA 150 patterns high-resolution, high aspect ratio, and even simple grayscale structures. It is available with 375nm and 405nm lasers, have pneumatic autofocus, and is able to pattern from 12mm to 6in wafer. Check with resist manufacturer to find the starting dosage. New resists will require optimization.
NOTE:
1) Users are limited to 3 hours max during normal hours (7 AM to 5 PM).
Either 1 long reservation, or several smaller ones totaling 3 hours
2) If longer runs or additional times are needed, reservations must be made during after-hours (after 5 PM)
3) Do not use the tool without reserving it
4) Do not make any reservations further than a week in advance
5) Do not make reservations for more than 2 days at a time
6) Be ready to use the tool during the time(s) you have it reserved. Arrive early to clean your sample, spin & bake resist, etc. so that you can begin your write when your reservation starts
7) Failure to follow these guidelines will result in loss of tool access |
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| Location | FabLab | Photolithography Tunnel | ||||||||||||||||
| Manufacturer |
Heidelberg MLA 150 |
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| Staff Contact |
 Nam Kimnsk0248@umd.edu 301-405-6664 |
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| Rates | No Charge $0/hr Large Commercial $242/hr Small Commercial / MTECH $166/hr External Non-profit / University $126/hr UMD $81/hr |
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| Reservations |
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| Logs |
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| Manuals | You must have lab permissions to view the manuals. Please login to view manuals or contact the lab staff to obtain permissions. |
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| Recipes |
