September 25, 2017 UMD Home FabLab AIMLab
Back to Equipment List Developing Bench
Description NOTE: This Bench is for developing photoresist only. Use other wet benches for any other wet processing you need to do.

Working with wet chemicals can be hazardous if you don't follow the proper procedures at all times. Violating procedure risks not only your health but also the health and safety of other users and may result in loss of access to FabLab for an extended period of time.
Location FabLab | Photo Tunnel
Manufacturer
Staff Contact FabLab Staff
fablab@umd.edu
Discussion Link Lithography Discussion Page
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Rates
UMD
$71/hr
External Non-profit / University
$108/hr
Small Commercial / MTECH
$150/hr
Large Commercial
$200/hr
Reservations No upcoming reservations at this time.
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Logs
Thu, Sep 21, 2017
5:15 pm - 5:30 pm
Yilin Wang
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Thu, Sep 21, 2017
11:30 am - 11:45 am
Mary Doolin
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Mon, Sep 18, 2017
4:30 pm - 4:45 pm
Mary Doolin
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Fri, Sep 15, 2017
1:30 pm - 1:45 pm
Mary Doolin
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Thu, Sep 14, 2017
4:30 pm - 4:45 pm
Mary Doolin
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Records to show:
SOPs
index.php (38 B)
photo-10_sop_developing_bench.pdf (59.58 KB)
Manuals

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Recipes

Colleges A. James Clark School of Engineering
The College of Computer, Mathematical, and Natural Sciences

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