| Operational Status | ● Online | ||||||||||||||||
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| Description |
NOTE: This Bench is for developing photoresist only. Use other wet benches for any other wet processing you need to do.
Working with wet chemicals can be hazardous if you don't follow the proper procedures at all times. Violating procedure risks not only your health but also the health and safety of other users and may result in loss of access to FabLab for an extended period of time. |
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| Location | FabLab |
Photo Tunnel
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| Staff Contact |
FabLab Staff fablab@umd.edu |
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| Rates | Large Commercial $242/hr Small Commercial / MTECH $166/hr External Non-profit / University $126/hr UMD $81/hr No Charge $0/hr |
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| Manuals | You must have lab permissions to view the manuals. Please login to view manuals or contact the lab staff to obtain permissions. |
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| Recipes | Photoresist ProcessesAZ4620_process.doc (25.5 KB)NPR9 process.doc (24.5 KB) NR9-1500PY.pdf (88.62 KB) SPR220_resist_process.doc (25.5 KB) baseline_shipley_1813_resist_chlorobenzene_lift.doc (28 KB) chlorobenzene_lift.doc (28.5 KB) photo_resist_pouring_procedure.doc (24 KB) shipley_1813_positive_photolithography_process.doc (27 KB) |
