November 24, 2017 UMD Home FabLab AIMLab
Back to Equipment List Developing Bench
Description NOTE: This Bench is for developing photoresist only. Use other wet benches for any other wet processing you need to do.

Working with wet chemicals can be hazardous if you don't follow the proper procedures at all times. Violating procedure risks not only your health but also the health and safety of other users and may result in loss of access to FabLab for an extended period of time.
Location FabLab | Photo Tunnel
Manufacturer
Staff Contact FabLab Staff
fablab@umd.edu
Discussion Link Lithography Discussion Page
Login Help
Rates
UMD
$71/hr
External Non-profit / University
$108/hr
Small Commercial / MTECH
$150/hr
Large Commercial
$200/hr
Reservations No upcoming reservations at this time.
Please login to make a reservation.
Logs
Wed, Nov 15, 2017
10:00 am - 10:15 am
David Shahin
View Reservation
Tue, Nov 14, 2017
4:00 pm - 4:15 pm
David Shahin
View Reservation
Mon, Nov 13, 2017
12:45 pm - 1:00 pm
David Shahin
View Reservation
Mon, Oct 30, 2017
8:00 am - 8:15 am
David Shahin
View Reservation

Deleted by: David Shahin

Fri, Oct 27, 2017
8:30 am - 8:45 am
David Shahin
View Reservation
Records to show:
SOPs
index.php (38 B)
photo-10_sop_developing_bench.pdf (59.58 KB)
Manuals

You must have lab permissions to view the manuals.

Please login to view manuals or contact the lab staff to obtain permissions.

Recipes

Colleges A. James Clark School of Engineering
The College of Computer, Mathematical, and Natural Sciences

Communicate Contact Us
Contact the Webmaster
Google+
Follow us on TwitterTwitter logo

Links Privacy Policy
Sitemap
RSS

Copyright The University of Maryland University of Maryland
2004-2017