May 26, 2022 UMD Home FabLab AIMLab
Oxford ICP Etcher(Chlorine) Back to Equipment List
Operational Status ‚óŹ Online
Description This Oxford Plasmalab System 100 is an Inductively Coupled Plasma (ICP) reactive ion etcher. Gases plumbed to the system include:
  • Cl2, O2
  • SiCl4, SF6
  • CH4, Ar
  • H2, N2
This etcher is used primarily for etching III-V materials and aluminum.

The standard operating procedure for this tool is loaded into the PC that supports the ICP etcher.
Location FabLab | ETCH Tunnel
Manufacturer Oxford Instruments
Staff Contact ThomasThomas Loughran
External Non-profit / University
Small Commercial / MTECH
Large Commercial
No Charge
Reservations No upcoming reservations at this time.
Thu, May 26, 2022
1:00 pm - 2:00 pm
Liuxin Gu
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Wed, May 25, 2022
3:00 pm - 4:00 pm
Nam Kim
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For Haotian
Tue, May 24, 2022
1:30 pm - 2:15 pm
xiheng ai
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Mon, May 23, 2022
12:15 pm - 1:30 pm
Sean O'Leary
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Fri, May 20, 2022
10:30 am - 11:00 am
Nam Kim
View Reservation
Records to show:
Oxford Chlorine Etcher SOP.pdf (384 KB)
index.php (38 B)

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Colleges A. James Clark School of Engineering
The College of Computer, Mathematical, and Natural Sciences

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