May 26, 2022 UMD Home FabLab AIMLab
Oxford PECVD Back to Equipment List
Operational Status ● Online
Description This Oxford Plasmalab System 100 is a Plasma Enhanced Chemical Vapor Deposition (PECVD) system. It is used to deposit low-stress thin films with excellent step coverage on a variety of samples at low temperatures (generally 200 - 300 O C). These thin films include:
  • SiO2 (both TEOS and SiH4-based)
  • SiNx
  • SiON
  • Α - Si
Location FabLab | CVD Tunnel
Manufacturer Oxford Instruments PlasmaLab System 100
Staff Contact ThomasThomas Loughran
External Non-profit / University
Small Commercial / MTECH
Large Commercial
No Charge
Reservations No upcoming reservations at this time.
Wed, May 25, 2022
10:15 pm - 10:30 pm
Sam Harper
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Wed, May 25, 2022
4:30 pm - 4:45 pm
xiheng ai
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Wed, May 25, 2022
8:30 am - 9:00 am
Yuxi Jiang
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Tue, May 24, 2022
3:00 pm - 4:15 pm
xiheng ai
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Tue, May 24, 2022
2:45 pm - 3:00 pm
Sam Harper
View Reservation
Records to show:
Oxford PECVD SOP.pdf (709.05 KB)
index.php (38 B)

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Colleges A. James Clark School of Engineering
The College of Computer, Mathematical, and Natural Sciences

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