November 20, 2017 UMD Home FabLab AIMLab
Back to Equipment List Oxford PECVD
Description This Oxford Plasmalab System 100 is a Plasma Enhanced Chemical Vapor Deposition (PECVD) system. It is used to deposit low-stress thin films with excellent step coverage on a variety of samples at low temperatures (generally 200 - 300 O C). These thin films include:
  • SiO2 (both TEOS and SiH4-based)
  • SiNx
  • SiON
  • Α - Si
Location FabLab | CVD Tunnel
Manufacturer Oxford Instruments PlasmaLab System 100
Link
Staff Contact ThomasThomas Loughran
tcl@umd.edu
301-405-3642
Discussion Link Deposition Discussion Page
Login Help
Rates
UMD
$71/hr
External Non-profit / University
$108/hr
Small Commercial / MTECH
$150/hr
Large Commercial
$200/hr
Reservations
Date Start End User
11/20/2017 12:00 PM 02:30 PM Yang Zhang

Please login to make a reservation.
Logs
Mon, Nov 20, 2017
12:00 pm - 2:30 pm
Yang Zhang
View Reservation
Sun, Nov 19, 2017
12:00 pm - 12:30 pm
Kevin Palm
View Reservation
Sun, Nov 19, 2017
11:15 am - 11:30 am
Mitchell Gross
View Reservation
Sun, Nov 19, 2017
10:30 am - 11:15 am
Kevin Palm
View Reservation
Sat, Nov 18, 2017
4:45 pm - 5:15 pm
Kevin Palm
View Reservation
Records to show:
SOPs
Oxford PECVD SOP.pdf (709.05 KB)
index.php (38 B)
Manuals

You must have lab permissions to view the manuals.

Please login to view manuals or contact the lab staff to obtain permissions.

Recipes

Colleges A. James Clark School of Engineering
The College of Computer, Mathematical, and Natural Sciences

Communicate Contact Us
Contact the Webmaster
Google+
Follow us on TwitterTwitter logo

Links Privacy Policy
Sitemap
RSS

Copyright The University of Maryland University of Maryland
2004-2017