March 26, 2025 UMD Home FabLab AIMLab
Oxford PECVD Back to Equipment List
Operational Status ● Offline
Description This Oxford Plasmalab System 100 is a Plasma Enhanced Chemical Vapor Deposition (PECVD) system. It is used to deposit low-stress thin films with excellent step coverage on a variety of samples at low temperatures (generally 200 - 300 O C). These thin films include:
  • SiO2 (both TEOS and SiH4-based)
  • SiNx
  • SiON
  • Α - Si
Location FabLab | CVD Tunnel
Manufacturer Oxford Instruments PlasmaLab System 100
Link
Staff Contact ThomasThomas Loughran
tcl@umd.edu
301-405-3642
Rates
Large Commercial
$242/hr
Small Commercial / MTECH
$166/hr
External Non-profit / University
$126/hr
UMD
$81/hr
No Charge
$0/hr
Reservations No upcoming reservations at this time.
Logs
Thu, Jan 23, 2025
4:15 pm - 4:45 pm
Utku Noyan
View Reservation
Si3N4 30nm
Thu, Jan 23, 2025
3:15 pm - 4:15 pm
xiheng ai
View Reservation
Thu, Jan 23, 2025
12:45 pm - 1:15 pm
Tahir Mahmud
View Reservation
Wed, Jan 22, 2025
2:00 pm - 4:00 pm
Masoud Heidari Khouzani
View Reservation
Wed, Jan 22, 2025
12:00 pm - 12:30 pm
Utku Noyan
View Reservation

Deleted by: Utku Noyan

Si3n4
Records to show:
SOPs
Oxford PECVD SOP.pdf (709.05 KB)
index.php (38 B)
Manuals

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Recipes

Colleges A. James Clark School of Engineering
The College of Computer, Mathematical, and Natural Sciences

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