April 15, 2025 UMD Home FabLab AIMLab
Oxford PECVD Back to Equipment List
Operational Status ● Online
Description This Oxford Plasmalab System 100 is a Plasma Enhanced Chemical Vapor Deposition (PECVD) system. It is used to deposit low-stress thin films with excellent step coverage on a variety of samples at low temperatures (generally 200 - 300 O C). These thin films include:
  • SiO2 (both TEOS and SiH4-based)
  • SiNx
  • SiON
  • Α - Si
Location FabLab | CVD Tunnel
Manufacturer Oxford Instruments PlasmaLab System 100
Link
Staff Contact ThomasThomas Loughran
tcl@umd.edu
301-405-3642
Rates
Large Commercial
$242/hr
Small Commercial / MTECH
$166/hr
External Non-profit / University
$126/hr
UMD
$81/hr
No Charge
$0/hr
Reservations
Date Start End User
04/16/2025 12:15 AM 12:00 PM Thomas Loughran
04/17/2025 12:15 AM 11:30 AM Thomas Loughran
04/18/2025 11:45 AM 07:15 PM Mark Lecates
Logs
Fri, Apr 18, 2025
11:45 am - 7:15 pm
Mark Lecates
View Reservation
Thu, Apr 17, 2025
- 11:30 am
Thomas Loughran
View Reservation
Wed, Apr 16, 2025
- 12:00 pm
Thomas Loughran
View Reservation
off line for TEOS calibration runs.
Tue, Apr 15, 2025
1:00 pm -
Thomas Loughran
View Reservation
TEOS gas supply lines pump and purge.
Tue, Apr 15, 2025
9:30 am - 10:15 am
Tahir Mahmud
View Reservation
Records to show:
SOPs
Oxford PECVD SOP.pdf (709.05 KB)
index.php (38 B)
Manuals

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Recipes

Colleges A. James Clark School of Engineering
The College of Computer, Mathematical, and Natural Sciences

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