September 25, 2017 UMD Home FabLab AIMLab
Back to Equipment List Oxford Etcher (Fluorine)

This Oxford Plasmalab System 100 is an Inductively Coupled Plasma (ICP) reactive ion etcher.

    Gases plumbed to the system include:
  • SF6
  • C4F8
  • CHF3
  • CF4
  • N2
  • O2

This etcher is used primarily for etching silicon and silicon oxides. The standard operating procedure and recipes for this tool is loaded into the PC that supports the ICP etcher.

Location FabLab | ETCH Tunnel
Manufacturer Oxford Instruments
Staff Contact MarkMark Lecates
Discussion Link Etching Discussion Page
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Mon, Sep 25, 2017
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Records to show:
Oxford Flourine Etcher SOP.pdf (252.38 KB)
index.php (38 B)

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