May 26, 2022 UMD Home FabLab AIMLab
Oxford Etcher (Fluorine) Back to Equipment List
Operational Status ‚óŹ Online
Description This Oxford Plasmalab System 100 is an Inductively Coupled Plasma (ICP) reactive ion etcher. Gases plumbed to the system include: SF6-C4F8-CHF3-CF4-Ar-O2-He This etcher is used primarily for etching silicon and silicon oxides. The standard operating procedure and recipes for this tool is loaded into the PC that supports the ICP etcher.
Location FabLab | ETCH Tunnel
Manufacturer Oxford Instruments
Staff Contact MarkMark Lecates
External Non-profit / University
Small Commercial / MTECH
Large Commercial
No Charge
Reservations No upcoming reservations at this time.
Thu, May 26, 2022
12:30 pm - 1:15 pm
Sean O'Leary
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Thu, May 26, 2022
11:15 am - 12:15 pm
Ruihao Ni
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Thu, May 26, 2022
9:30 am - 10:30 am
Haotian Wang
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Wed, May 25, 2022
4:30 pm - 5:00 pm
Haotian Wang
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Deleted by: Haotian Wang

Wed, May 25, 2022
3:30 pm - 4:15 pm
xiheng ai
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Records to show:
Oxford Flourine Etcher SOP.pdf (252.38 KB)
index.php (38 B)

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Colleges A. James Clark School of Engineering
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