June 30, 2025 UMD Home FabLab AIM Lab
Oxford Etcher (Fluorine) Back to Equipment List
Operational Status ● Online
Description This Oxford Plasmalab System 100 is an Inductively Coupled Plasma (ICP) reactive ion etcher. Gases plumbed to the system include: SF6-C4F8-CHF3-CF4-Ar-O2-He This etcher is used primarily for etching silicon and silicon oxides. The standard operating procedure and recipes for this tool is loaded into the PC that supports the ICP etcher.
Location FabLab | ETCH Tunnel
Manufacturer Oxford Instruments
Staff Contact MarkMark Lecates
mlecates@umd.edu
301-405-5197
Rates
Large Commercial
$242/hr
Small Commercial / MTECH
$166/hr
External Non-profit / University
$126/hr
UMD
$81/hr
No Charge
$0/hr
Reservations
Date Start End User
07/01/2025 10:30 AM 11:30 AM Maxwell Xuan
07/01/2025 12:00 PM 12:45 PM Ryan Purcell
07/01/2025 02:00 PM 03:00 PM Gregory Babic
Logs
Tue, Jul 01, 2025
2:00 pm - 3:00 pm
Gregory Babic
View Reservation
Tue, Jul 01, 2025
12:00 pm - 12:45 pm
Ryan Purcell
View Reservation
Tue, Jul 01, 2025
10:30 am - 11:30 am
Maxwell Xuan
View Reservation
Tue, Jul 01, 2025
8:30 am - 9:00 am
Sean O'Leary
View Reservation

Deleted by: Sean O'Leary

Mon, Jun 30, 2025
4:45 pm - 5:00 pm
Sheng-Wei Wang
View Reservation
Records to show:
SOPs
Oxford Flourine Etcher SOP.pdf (252.38 KB)
index.php (38 B)
Manuals

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Recipes

Colleges A. James Clark School of Engineering
The College of Computer, Mathematical, and Natural Sciences

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