March 26, 2025 UMD Home FabLab AIMLab
Oxford Etcher (Fluorine) Back to Equipment List
Operational Status ● Online
Description This Oxford Plasmalab System 100 is an Inductively Coupled Plasma (ICP) reactive ion etcher. Gases plumbed to the system include: SF6-C4F8-CHF3-CF4-Ar-O2-He This etcher is used primarily for etching silicon and silicon oxides. The standard operating procedure and recipes for this tool is loaded into the PC that supports the ICP etcher.
Location FabLab | ETCH Tunnel
Manufacturer Oxford Instruments
Staff Contact MarkMark Lecates
mlecates@umd.edu
301-405-5197
Rates
Large Commercial
$242/hr
Small Commercial / MTECH
$166/hr
External Non-profit / University
$126/hr
UMD
$81/hr
No Charge
$0/hr
Reservations
Date Start End User
03/26/2025 04:45 PM 05:00 PM xiheng ai
03/27/2025 01:00 PM 03:00 PM Sean O'Leary
03/28/2025 10:30 AM 11:45 AM Maxwell Xuan
Logs
Fri, Mar 28, 2025
10:30 am - 11:45 am
Maxwell Xuan
View Reservation
Thu, Mar 27, 2025
1:00 pm - 3:00 pm
Sean O'Leary
View Reservation
Wed, Mar 26, 2025
4:45 pm - 5:00 pm
xiheng ai
View Reservation
Wed, Mar 26, 2025
11:00 am - 11:30 am
Ryan Purcell
View Reservation
Tue, Mar 25, 2025
6:00 pm - 7:30 pm
Amirehsan Boreiri
View Reservation
Records to show:
SOPs
Oxford Flourine Etcher SOP.pdf (252.38 KB)
index.php (38 B)
Manuals

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Recipes

Colleges A. James Clark School of Engineering
The College of Computer, Mathematical, and Natural Sciences

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