April 15, 2025 UMD Home FabLab AIMLab
Oxford Etcher (Fluorine) Back to Equipment List
Operational Status ● Online
Description This Oxford Plasmalab System 100 is an Inductively Coupled Plasma (ICP) reactive ion etcher. Gases plumbed to the system include: SF6-C4F8-CHF3-CF4-Ar-O2-He This etcher is used primarily for etching silicon and silicon oxides. The standard operating procedure and recipes for this tool is loaded into the PC that supports the ICP etcher.
Location FabLab | ETCH Tunnel
Manufacturer Oxford Instruments
Staff Contact MarkMark Lecates
mlecates@umd.edu
301-405-5197
Rates
Large Commercial
$242/hr
Small Commercial / MTECH
$166/hr
External Non-profit / University
$126/hr
UMD
$81/hr
No Charge
$0/hr
Reservations
Date Start End User
04/16/2025 01:00 PM 05:00 PM Nishchal Tripathi
04/17/2025 08:00 AM 11:00 AM Sean O'Leary
04/18/2025 10:30 AM 11:30 AM Maxwell Xuan
04/18/2025 12:00 PM 05:15 PM Mark Lecates
Logs
Fri, Apr 18, 2025
12:00 pm - 5:15 pm
Mark Lecates
View Reservation
Fri, Apr 18, 2025
10:30 am - 11:30 am
Maxwell Xuan
View Reservation
Thu, Apr 17, 2025
8:00 am - 11:00 am
Sean O'Leary
View Reservation
Wed, Apr 16, 2025
1:00 pm - 5:00 pm
Nishchal Tripathi
View Reservation
Tue, Apr 15, 2025
5:00 pm - 9:30 pm
Nishchal Tripathi
View Reservation

Deleted by: Nishchal Tripathi

Records to show:
SOPs
Oxford Flourine Etcher SOP.pdf (252.38 KB)
index.php (38 B)
Manuals

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Recipes

Colleges A. James Clark School of Engineering
The College of Computer, Mathematical, and Natural Sciences

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