July 11, 2025 UMD Home FabLab AIM Lab
Oxford Etcher (Fluorine) Back to Equipment List
Operational Status ● Online
Description This Oxford Plasmalab System 100 is an Inductively Coupled Plasma (ICP) reactive ion etcher. Gases plumbed to the system include: SF6-C4F8-CHF3-CF4-Ar-O2-He This etcher is used primarily for etching silicon and silicon oxides. The standard operating procedure and recipes for this tool is loaded into the PC that supports the ICP etcher.
Location FabLab | ETCH Tunnel
Manufacturer Oxford Instruments
Staff Contact MarkMark Lecates
mlecates@umd.edu
301-405-5197
Rates
Large Commercial
$242/hr
Small Commercial / MTECH
$166/hr
External Non-profit / University
$126/hr
UMD
$81/hr
No Charge
$0/hr
Reservations No upcoming reservations at this time.
Logs
Mon, Jul 14, 2025
3:30 pm - 5:30 pm
Ghadah Alshalan
View Reservation

Deleted by: Ghadah Alshalan

Fri, Jul 11, 2025
1:00 pm - 3:00 pm
Ghadah Alshalan
View Reservation
Fri, Jul 11, 2025
10:30 am - 11:30 am
Maxwell Xuan
View Reservation
Thu, Jul 10, 2025
11:45 am - 1:45 pm
Bibek Ramdam
View Reservation

Deleted by: Bibek Ramdam

Thu, Jul 10, 2025
11:00 am - 11:15 am
Ryan Purcell
View Reservation
Records to show:
SOPs
Oxford Flourine Etcher SOP.pdf (252.38 KB)
index.php (38 B)
Manuals

You must have lab permissions to view the manuals.

Please login to view manuals or contact the lab staff to obtain permissions.

Recipes

Colleges A. James Clark School of Engineering
The College of Computer, Mathematical, and Natural Sciences

Communicate Join Email List
Contact Us
Follow us on TwitterTwitter logo

Links Privacy Policy
Sitemap
RSS

Copyright The University of Maryland University of Maryland
2004-2025