This Oxford Plasmalab System 100 is an Inductively Coupled Plasma (ICP) reactive ion etcher.
This etcher is used primarily for etching silicon and silicon oxides. The standard operating procedure and recipes for this tool is loaded into the PC that supports the ICP etcher.
|Location||FabLab | ETCH Tunnel|
|Discussion Link||Etching Discussion Page
External Non-profit / University
Small Commercial / MTECH
Please login to make a reservation.
You must have lab permissions to view the manuals.
Please login to view manuals or contact the lab staff to obtain permissions.