March 24, 2023 UMD Home FabLab AIMLab
Oxford Etcher (Fluorine) Back to Equipment List
Operational Status ‚óŹ Online
Description This Oxford Plasmalab System 100 is an Inductively Coupled Plasma (ICP) reactive ion etcher. Gases plumbed to the system include: SF6-C4F8-CHF3-CF4-Ar-O2-He This etcher is used primarily for etching silicon and silicon oxides. The standard operating procedure and recipes for this tool is loaded into the PC that supports the ICP etcher.
Location FabLab | ETCH Tunnel
Manufacturer Oxford Instruments
Staff Contact MarkMark Lecates
External Non-profit / University
Small Commercial / MTECH
Large Commercial
No Charge
Date Start End User
03/24/2023 01:30 PM 03:00 PM Abhijit Biswas
Fri, Mar 24, 2023
1:30 pm - 3:00 pm
Abhijit Biswas
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Fri, Mar 24, 2023
7:00 am - 10:00 am
Mark Lecates
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Thu, Mar 23, 2023
1:15 pm - 1:30 pm
Ryan Purcell
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Thu, Mar 23, 2023
12:00 pm - 12:30 pm
Abhijit Biswas
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Wed, Mar 22, 2023
2:45 pm - 3:15 pm
Sheron Lian
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Records to show:
Oxford Flourine Etcher SOP.pdf (252.38 KB)
index.php (38 B)

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Colleges A. James Clark School of Engineering
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