November 20, 2017 UMD Home FabLab AIMLab
Back to Equipment List Oxford Etcher (Fluorine)

This Oxford Plasmalab System 100 is an Inductively Coupled Plasma (ICP) reactive ion etcher.

    Gases plumbed to the system include:
  • SF6
  • C4F8
  • CHF3
  • CF4
  • N2
  • O2

This etcher is used primarily for etching silicon and silicon oxides. The standard operating procedure and recipes for this tool is loaded into the PC that supports the ICP etcher.

Location FabLab | ETCH Tunnel
Manufacturer Oxford Instruments
Staff Contact MarkMark Lecates
Discussion Link Etching Discussion Page
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External Non-profit / University
Small Commercial / MTECH
Large Commercial
Date Start End User
11/20/2017 10:00 AM 11:00 AM Shengjie Xie
11/20/2017 11:00 AM 12:00 PM Yang Zhang
11/20/2017 02:30 PM 03:30 PM Young Min Kim

Please login to make a reservation.
Mon, Nov 20, 2017
2:30 pm - 3:30 pm
Young Min Kim
View Reservation
Mon, Nov 20, 2017
11:00 am - 12:00 pm
Yang Zhang
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Mon, Nov 20, 2017
10:00 am - 11:00 am
Shengjie Xie
View Reservation
Sun, Nov 19, 2017
11:30 am - 11:45 am
Mitchell Gross
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Fri, Nov 17, 2017
5:00 pm - 5:30 pm
Jiahao Zhan
View Reservation
Records to show:
Oxford Flourine Etcher SOP.pdf (252.38 KB)
index.php (38 B)

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Colleges A. James Clark School of Engineering
The College of Computer, Mathematical, and Natural Sciences

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