September 25, 2017 UMD Home FabLab AIMLab
Back to Equipment List Tescan XEIA FEG SEM

The world's first fully integrated Xe plasma source FIB with SEM enables extremely high ion currents up to 2.5 μA thus increasing sputtering rate more than 50 times compared to conventional Ga source FIB. This predetermines XEIA for milling big volumes of materials that were time consuming or impossible in the past.

The XEIA is a fully PC controlled SEM with Schottky field emission cathode in combination with Xe Plasma Focused Ion Beam (SEM-FIB) column and also fully equipped with Gas Injection System (GIS) for five different gases. With more than 20 ports in the newly designed large sample chamber, the XEIA also integrates a variety of nano-analytical capabilities in one single instrument. The XEIA equipped with:

  • EDS (Energy Dispersive X-Ray Spectrometry)
  • CL (Cathodoluminescence)
Location AIM Lab | 1237E Kim Eng. Bldg.
Staff Contact Wen-AnWen-An Chiou
Discussion Link Metrology Discussion Page
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External Non-profit / University
Small Commercial / MTECH
Large Commercial
Date Start End User
09/25/2017 02:00 PM 06:00 PM Yiwen Hu

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Mon, Sep 25, 2017
2:00 pm - 6:00 pm
Yiwen Hu
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Fri, Sep 22, 2017
8:00 am - 9:00 am
Hua Xie
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Thu, Sep 21, 2017
5:00 pm - 7:00 pm
Yaoyu Ren
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Thu, Sep 21, 2017
2:00 pm - 5:00 pm
Yiwen Hu
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Thu, Sep 21, 2017
12:00 pm - 2:00 pm
Shengjie Xie
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