February 17, 2018 UMD Home FabLab AIMLab
Back to Equipment List Tescan XEIA FEG SEM

The world's first fully integrated Xe plasma source FIB with SEM enables extremely high ion currents up to 2.5 μA thus increasing sputtering rate more than 50 times compared to conventional Ga source FIB. This predetermines XEIA for milling big volumes of materials that were time consuming or impossible in the past.

The XEIA is a fully PC controlled SEM with Schottky field emission cathode in combination with Xe Plasma Focused Ion Beam (SEM-FIB) column and also fully equipped with Gas Injection System (GIS) for five different gases. With more than 20 ports in the newly designed large sample chamber, the XEIA also integrates a variety of nano-analytical capabilities in one single instrument. The XEIA equipped with:

  • EDS (Energy Dispersive X-Ray Spectrometry)
  • CL (Cathodoluminescence)
Location AIM Lab | 1237E Kim Eng. Bldg.
Staff Contact Wen-AnWen-An Chiou
External Non-profit / University
Small Commercial / MTECH
Large Commercial
Date Start End User
02/21/2018 02:30 PM 05:30 PM Zhezhen Fu
02/23/2018 02:00 PM 05:00 PM Yu Shi

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Fri, Feb 23, 2018
2:00 pm - 5:00 pm
Yu Shi
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SEM training / JCRao
Wed, Feb 21, 2018
2:30 pm - 5:30 pm
Zhezhen Fu
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Training / JCRao
Fri, Feb 16, 2018
3:30 pm - 4:30 pm
Mustafa Buyukkaya
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Thu, Feb 15, 2018
1:30 pm - 2:30 pm
Changmin Lee
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Thu, Feb 15, 2018
10:00 am - 11:30 am
Hua Xie
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