November 24, 2017 UMD Home FabLab AIMLab
Description The Trion RIE is used to remove photoresist residue. Plumbed with O2,CF4 and Sf6 the Etcher is an aggressive etcher for any organic material. Can be used to etch thin layers of SiO2 ,SiN and Si
Location FabLab | ETCH Tunnel
Manufacturer
Staff Contact MarkMark Lecates
mlecates@umd.edu
301-405-5197
Discussion Link Etching Discussion Page
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Rates
UMD
$71/hr
External Non-profit / University
$108/hr
Small Commercial / MTECH
$150/hr
Large Commercial
$200/hr
Reservations No upcoming reservations at this time.
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Logs
Tue, Nov 07, 2017
4:00 pm - 4:15 pm
Gang Li
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Fri, Nov 03, 2017
2:00 pm - 2:15 pm
Gang Li
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Deleted by: Gang Li

Fri, Nov 03, 2017
1:00 pm - 1:15 pm
Gang Li
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Tue, Oct 24, 2017
1:00 pm - 1:15 pm
Gang Li
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Fri, Oct 20, 2017
1:00 pm - 1:15 pm
Gang Li
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Colleges A. James Clark School of Engineering
The College of Computer, Mathematical, and Natural Sciences

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