April 15, 2025 UMD Home FabLab AIMLab
Operational Status ● Online
Description The Trion RIE is used to remove photoresist residue. Plumbed with O2,CF4,CHF3 and Sf6 the Etcher is an aggressive etcher for any organic material. Can be used to etch thin layers of SiO2 ,SiN and Si
Location FabLab | ETCH Tunnel
Manufacturer
Staff Contact MarkMark Lecates
mlecates@umd.edu
301-405-5197
Rates
Large Commercial
$242/hr
Small Commercial / MTECH
$166/hr
External Non-profit / University
$126/hr
UMD
$81/hr
No Charge
$0/hr
Reservations
Date Start End User
04/18/2025 12:00 PM 05:00 PM Mark Lecates
Logs
Fri, Apr 18, 2025
12:00 pm - 5:00 pm
Mark Lecates
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Tue, Apr 15, 2025
12:15 pm - 12:30 pm
Hongyi Sun
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Mon, Apr 14, 2025
3:00 pm - 3:15 pm
Seungyeop Lee
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Mon, Apr 14, 2025
2:00 pm - 2:30 pm
Hongyi Sun
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Mon, Apr 14, 2025
12:30 pm - 1:00 pm
Parmida Sadat Alhosseini
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SOPs
Manuals

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Recipes

Colleges A. James Clark School of Engineering
The College of Computer, Mathematical, and Natural Sciences

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