May 30, 2023 UMD Home FabLab AIMLab
Operational Status ‚óŹ Online
Description The Trion RIE is used to remove photoresist residue. Plumbed with O2,CF4,CHF3 and Sf6 the Etcher is an aggressive etcher for any organic material. Can be used to etch thin layers of SiO2 ,SiN and Si
Location FabLab | ETCH Tunnel
Manufacturer
Staff Contact MarkMark Lecates
mlecates@umd.edu
301-405-5197
Rates
UMD
$75/hr
External Non-profit / University
$116/hr
Small Commercial / MTECH
$158/hr
Large Commercial
$220/hr
No Charge
$0/hr
Reservations No upcoming reservations at this time.
Logs
Tue, May 30, 2023
4:45 pm - 5:00 pm
Daniel Lewis
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Deleted by: Daniel Lewis

Tue, May 30, 2023
2:45 pm - 3:00 pm
Daniel Lewis
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Tue, May 30, 2023
12:30 pm - 12:45 pm
Andrew Evangelista
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Fri, May 26, 2023
1:00 pm - 1:30 pm
Nathaniel Fried
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With Nam
Thu, May 25, 2023
5:30 pm - 5:45 pm
Daniel Lewis
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Colleges A. James Clark School of Engineering
The College of Computer, Mathematical, and Natural Sciences

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