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| Description |
The PlasmaPro 100 PECVD system is specifically designed to produce high quality films with excellent uniformity and control of film properties such as refractive index, stress, electrical characteristics and wet chemical etch rate. Our cutting-edge Plasma Enhanced CVD system is suitable for dielectric films passivation (e.g. SiO2, SixNy), silicon carbide, amorphous silicon, hard mask deposition and anti-reflective coatings.
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| Location | FabLab |
CVD Tunnel
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| Manufacturer |
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| Staff Contact |
 Mark Lecatesmlecates@umd.edu 301-405-5197 |
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| Rates | No Charge $0/hr Large Commercial $266/hr Small Commercial / MTECH $183/hr External Non-profit / University $139/hr UMD $89/hr |
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| Reservations | No upcoming reservations at this time. | |||||||||||||||
| Logs |
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| Manuals | You must have lab permissions to view the manuals. Please login to view manuals or contact the lab staff to obtain permissions. |
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| Recipes |
